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3T-iRAM (R) Technology

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Page Contents:

General Description
Future Generations of 3T-iRAM®
Frequently Asked Questions
Related Pages
Contact Information

General Description:

Tezzaron's 3T-iRAM® memory technology, based on the time-tested DRAM model, offers DRAM-like advantages in cost and density; however, its novel current-sensing process achieves SRAM-like performance. The name "3T-iRAM" comes from the three-transistor cell design plus the letter "i" -- the engineering symbol for electric current -- to represent the current-sensing technology employed.

3T-iRAM Speed

The dramatic speed of 3T-iRAM was achieved by re-designing the DRAM read mechanism to react to changes in current rather than changes in voltage. In memory circuits, the current changes more quickly than the voltage does, so changes in current can be detected more quickly than changes in voltage. By exploiting this difference, 3T-iRAM technology can provide better-than-SRAM speed at a much lower cost.

3T-iRAM chips incorporate another speed advantage. In many memory devices, some idle time is required in “turnaround” – that is, when a read command is followed by a write command, or vice versa, the memory “bus” is idle for one or more cycles. 3T-iRAM chips require no idle time at all on turnaround; this contributes to their speed.

3T-iRAM Density

3T-iRAM provides twice the capacity of standard SRAM in exactly the same footprint. The reason for this is simple: standard SRAM technology requires six transistors for each memory cell, but each 3T-iRAM cell needs only three transistors.

3T-iRAM Soft Error Resistance

Because 3T-iRAM is built on DRAM technology, it shares DRAM’s reliability; like DRAM, it is more resistant to soft errors than SRAM.

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Future Generations of 3T-iRAM

Stacking

Some 3T-iRAM products will be built in a stacked configuration using Tezzaron's patented FaStack® technology. FaStack’s revolutionary design and circuitry will give these stacked parts greater reliability and much higher densities than monolithic 3T-iRAM parts, but at somewhat lower speeds.

Smaller Geometries

Future 3T-iRAM generations will be built with a silicon process that allows smaller features, improving speed and density in both the original monolithic design and in the stacked products.

Multi-Bit Cells

Because 3T-iRAM senses current rather than voltage, very precise measurements are possible. In fact, current can be measured with a precision six orders of magnitude greater than is possible with voltage. This raises the possibility of multi-bit cells – storing several bits in each cell at widely separated values, as is presently done with high-density Flash chips. 3T-iRAM’s multi-bit cell design adds a capacitor to each three-transistor cell, but because the capacitor can overlap the transistors, it does not greatly increase the cell area. Each multi-bit cell can hold as many as eight bits; when combined with FaStack stacking, this enables capacities as large as 8 Gbit without increasing the footprint.

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Frequently Asked Questions

Q: Is 3T-iRAM a kind of SRAM, or is it DRAM?
A: 3T-iRAM is closer to DRAM, but it has some unique properties. It is dynamic in that refresh is required, but 3T-iRAM reads are nondestructive (unlike DRAM reads). Whereas DRAM uses voltage deflection on a bit-line pair, 3T-iRAM provides a real positive current drive. This positive drive reduces noise sensitivity and increases speed.

Q: Is 3T-iRAM faster than SRAM?
A: Yes, it generally is. The higher speed is mostly due to 3T-iRAM's smaller cell size, lower bit-line capacitance, and better bit-line drive from the memory cells. Even with the addition of hidden refresh, 3T-iRAM will perform at least as fast as SRAM, in a much smaller area, and using less power.

Q: How does 3T-iRAM compare to 1T SRAM?
A: 1T SRAM provides a cell size similar to that of 3T-iRAM, but 3T-iRAM provides better speed - in fact, the speed of 1T SRAM is comparable to that of ordinary DRAM of the same array size.

Q: Is 3T-iRAM a good replacement for all types of SRAMs?
A: Different types of SRAMs require different replacements. The first wave of stand-alone 3T-iRAM parts, built in a standard CMOS logic process, can replace high-speed SRAMs. Another version of 3T-iRAM, already under development, is optimized for incorporation in an embedded DRAM process; this version will be better for replacing large, low-power SRAMs. The latter version will achieve lower power and higher density than is available with any DRAM or SRAM structure.

Q: Can I run 3T-iRAM slower than 1GHz?
A: Yes. We will offer two types of 3T-iRAM parts: Type 1 is an SRAM drop-in replacement, and Type 2 uses an externally controlled refresh. Type 1 (SRAM replacement) is designed to operate anywhere from DC to full rated speed. Type 2 (external refresh) may be run at any speed up to the full rated speed, provided that the refresh requirements are met.

Q: What processes have been used with the 3T-iRAM technology?
A: We have run 3T-iRAM components in 0.5µm, 0.35µm, 0.25µm, 0.13µm, and 90nm processes; 0.13µm parts are in production.

Q: How long has 3T-iRAM been in production?
A: Proprietary memory blocks that incorporate 3T-iRAM technology have been in volume production since 1999. The first stand-alone memory prototype was produced in 2003. Commercial parts began production in 2008.

Q: Can this technology be built in any fab?
A: Yes. Tezzaron has produced 3T-iRAM components in no fewer than 5 different foundries and 6 different processes.

Q: Is any special processing required?
A: No. All 3T-iRAM parts to date have used standard single poly CMOS processing. Tezzaron is in discussions with some manufacturers about higher-performance parts; if these are developed, they could require unique processing.

Q: Can 3T-iRAM be built in a DRAM Fab?
A: Yes. While Tezzaron has so far concentrated on maximum portability, 3T-iRAM can easily be altered to run in a DRAM fabrication process.

Q: What voltage does 3T-iRAM use?
A: 3T-iRAM operating voltage depends on the process in which it is made. The 90nm prototype was designed for 1.2V operation, whereas the 0.5µm part previously created ran at 5V. In general, the lowest possible operating voltage is 2.5 to 3 times the threshold voltage (Vt).

Q: What is array efficiency, and how does 3T-iRAM measure up?
A: Array efficiency is a measurement of how much area in a memory block is used by memory cells compared to the area used by drivers, sense amps, and other required support circuitry. The highest performance 3T-iRAM has array efficiencies in the 75% range. Other versions of 3T-iRAM (with somewhat slower performance) can reach efficiencies of 90%.

Q: What is the bit cell size?
A: In a 90nm process, the 3T-iRAM bit-cell size is 0.59 square µm. For a rough estimate in any process, a 3T-iRAM bit-cell is just under 50% the size of an SRAM bit-cell.

Q: How sensitive to soft errors are 3T-iRAM parts?
A: 3T-iRAM parts built in a standard CMOS process are less sensitive than standard SRAMs but more sensitive than DRAMs. Soft error sensitivity has a lot to do with the internal capacitance of the bit-cell: higher capacitance means lower susceptibility. 3T-iRAM in a standard CMOS process has 2 to 4 times the storage node capacitance of a standard SRAM in the same process. Tezzaron is working on a version of 3T-iRAM to be built in an embedded DRAM process. Among other significant benefits, this version should have a lower soft error rate than competitive standard DRAM solutions.

Q: Can I obtain 3T-iRAM for SOC integration?
A: Yes. Direct your inquiries to Memory@tezzaron.com.

Q: Can 3T-iRAM be extended to dual port, multi-port, CAM, or other specialty memories?
A: Yes. 3T-iRAM is easily adapted to these and other memory architectures.

Q: How often do 3T-iRAM memory cells need to be refreshed?
A: This depends on a number of factors such as process, density and temperature range for operation. Typically, the refresh period is tens to hundreds of microseconds in a standard CMOS process. The "SRAM-replacement" 3T-iRAM parts feature completely hidden refresh.

Q: Is the standard 3T-iRAM bit-cell single-port or dual-port memory?
A: Neither: 3T-iRAM is best described as "port and half" memory.  Each 3T bit-cell has independent read and write bit-lines and control signals, allowing some overlapping of functions. A standard 3T-iRAM bit-cell has more overlap capability than a typical single-port bit-cell, but not as much as a true dual-port bit-cell. Hence "port and a half."

Q: What densities are planned?
A: Current devices are 72Mb; Tezzaron plans to produce up to 144Mb. Larger sizes are possible and may be produced based on market demand.

Q: Are there currently any second sources for 3T-iRAM parts?
A: No, but Tezzaron plans to provide one or more in the future.

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Related Pages:

bulletSRAM Replacement Products

bulletPaper: "Tezzaron's 3T-iRAM" (Adobe .pdf format, 5 pages, 98 KB)

bulletPhotos of 3T-iRAM® Prototype (PSiRAM)

bulletPress:
bulletPress release: Chartered, Tezzaron Team Up to Deliver Ultra High-Speed Memory Solution (June 2007)
bullet Tezzaron, Chartered working on 2D "iRAM" hybrid, 3D ICs to come Wafer News (June 2007)
bulletPress Release: Tezzaron Inks Sales Rep Contracts for SRAM (September 2005)
bulletPress Release: Tezzaron Wins $1M in Purchase Orders (May 2004)
bullet" New Memory Technology Promises Top Speeds" Electronic Products (November 2003)
bulletPress Release: New Memory Technology is World's Fastest (August 2003)
bullet" Tezzaron Prototypes Pseudostatic Memory" EE Times (August 2003)
bullet "Tezzaron delivers challenge to SRAM, DRAM" EBN (August 2003)
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Contact Information:

Tezzaron® Semiconductor
630-505-0404
Memory@tezzaron.com

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Copyright © 2002-2009 Tezzaron® Semiconductor.  All rights reserved.  Revised: July 27, 2009
 

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